Activated Carbon for Semiconductor Cleanroom

Spherical Activated Carbon for Chemical Filters in Semiconductor Cleanrooms

Spherical Activated Carbon for Semiconductor Cleanroom

Our Spherical activated carbon SS-2 for chemical filtration is produced using spherical synthetic polymer resin as its precursor. Its pore structure is precisely engineered to promote the physical adsorption of both high- and low-molecular-weight organic compounds.

Compared with most synthetic carbon materials, SS-2 offers higher mechanical hardness and significantly reduced carbon dust release. It can also serve as a base material for catalyst supports.

 SS-2 is designed for the control of airborne molecular contamination (AMC) in semiconductor cleanrooms, data centers, laboratories, and other sensitive environments. It helps remove molecular contaminants, including acidic, alkaline, and organic compounds, thereby helping protect process equipment, process materials, and personnel from AMC-related contamination.

PRODUCT RECOMMENDATION
Specifications Value/Unit
Appearance
Black sphere
BET Surface Area
>1300 m2/g
Particle Size
0.56-0.65 mm
Moisture
<1%
Ash
<0.5%
Activated Carbon for Cleanroom
Spherical Activated Carbon SS for Chemical Filters

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